Production data from a Leica ZBA31H+ shaped e-beam mask writer located at the Photronics facility, Manchester, England

Stephen Johnson; Dominic Loughran; Peter Osborne; Pierre Sixt; Hans-Joachim Doering

doi:10.1117/12.351124

25 June 1999 Production data from a Leica ZBA31H+ shaped e-beam mask writer located at the Photronics facility, Manchester, England

Stephen Johnson, Dominic Loughran, Peter Osborne, Pierre Sixt, Hans-Joachim Doering

Author Affiliations +

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351124
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The ZBA31H+) is a variable shaped spot, vector scan e- beam lithography system operating at 20 keV. The specified performance is designed to produce reticles to 250 nanometer design rules, and beyond. In November 98 the acceptance results of a newly installed Leica ZBA31H+), at Photonic Manchester, were presented in a paper at the VDE/VDI 15th European Conference on Mask Technology. This paper is a continuation of that work and presents data from a capability study carried out, on 4000 angstrom EBR9 HS31 resist. Analysis of: mean to target, uniformity, X/Y bias, isolated vs. dense linewidths, linearity, and registration performance of the tool is presented, and the effects of re- iterative develop on process capability compared. Theoretically, a shaped beam system has advantages over raster scan in terms of write time and edge definition capabilities. In this paper, comparative write times against an Etec Mebes 4500 system are included. The ZBA31H+) has to write very small polygons in order to image non-axial or non-45 degree features. The resulting effect on image quality and write time is investigated. In order to improve the fidelity of small OPC structures, Leica have investigated alternative writing strategies, and their results to data are presented here.

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Stephen Johnson, Dominic Loughran, Peter Osborne, Pierre Sixt, and Hans-Joachim Doering "Production data from a Leica ZBA31H+ shaped e-beam mask writer located at the Photronics facility, Manchester, England", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351124

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