X-ray mask fabrication at CXrL

Quinn J. Leonard; Jaz Bansel; Lei Yang; Olga Vladimirsky; Srinivas B. Bollepalli; Mumit Khan; Yuli Vladimirsky; Franco Cerrina; James Welch Taylor; Klaus Simon; Lynn Charles Rathbun; Richard C. Tiberio

doi:10.1117/12.351147

25 June 1999 X-ray mask fabrication at CXrL

Quinn J. Leonard, Jaz Bansel, Lei Yang, Olga Vladimirsky, Srinivas B. Bollepalli, Mumit Khan, Yuli Vladimirsky, Franco Cerrina, James Welch Taylor, Klaus Simon, Lynn Charles Rathbun, Richard C. Tiberio

Author Affiliations +

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351147
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Availability of production-worthy x-ray masks is of great concern to the lithographic community in anticipation of insertion of x-ray lithography as the leading contender among the next generation lithographies.

Citation Download Citation

Quinn J. Leonard, Jaz Bansel, Lei Yang, Olga Vladimirsky, Srinivas B. Bollepalli, Mumit Khan, Yuli Vladimirsky, Franco Cerrina, James Welch Taylor, Klaus Simon, Lynn Charles Rathbun, and Richard C. Tiberio "X-ray mask fabrication at CXrL", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351147

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