Modeling of laminar e-beam source for SCALPEL

Warren K. Waskiewicz; James Alexander Liddle; Victor Katsap

doi:10.1117/12.370140

15 November 1999 Modeling of laminar e-beam source for SCALPEL

Warren K. Waskiewicz, James Alexander Liddle, Victor Katsap

Proceedings Volume 3777, Charged Particle Optics IV; (1999) https://doi.org/10.1117/12.370140
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

The SCALPEL e-beam lithography tool requires an extremely uniform e-beam to illuminate the Mask. To meet this requirement, the SCALPEL POL tool source cathode operates in the temperature limited mode. In this mode, all cathode irregularities are imaged at the Mask plane due to the high DOF of the gun immersion objective. We have studied the possibility of Mask illumination with a laminar e-beam having its virtual source located beyond the immersion objective DOF. In this case, using a positively biased Wehnelt, one can obtain a laminar e-beam that provides high emittance and low brightness illumination, while also yielding an efficient in- gun correction of beam properties.

Citation Download Citation

Warren K. Waskiewicz, James Alexander Liddle, and Victor Katsap "Modeling of laminar e-beam source for SCALPEL", Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); https://doi.org/10.1117/12.370140

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