Comparison and analysis on measurement of optical parameters of some semiconductor films by two methods

Jing Li; Fuxi Gan

doi:10.1117/12.371158

30 November 1999 Comparison and analysis on measurement of optical parameters of some semiconductor films by two methods

Jing Li, Fuxi Gan

Author Affiliations +

Proceedings Volume 3806, Recent Advances in Metrology, Characterization, and Standards for Optical Digital Data Disks; (1999) https://doi.org/10.1117/12.371158
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

The optical parameters of GeTe and Ge₂Sb₂Te₅ semiconductor films by thermal treatment have been measured carefully by using a new method. A compared study by means of using a spectrum ellipsometer is presented. The optical parameters of the sample films are precisely obtained through the processes of data simulation and correction of the old calculation model. In the meantime, the data calculations of the same samples measured by a spectrum ellipsometer are given, and the complex refractive index curves of them in the spectrum range from 250 nm to 830 nm are obtained.

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Jing Li and Fuxi Gan "Comparison and analysis on measurement of optical parameters of some semiconductor films by two methods", Proc. SPIE 3806, Recent Advances in Metrology, Characterization, and Standards for Optical Digital Data Disks, (30 November 1999); https://doi.org/10.1117/12.371158

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