Defect sensitivity and inspectability of the KLA SEMSpec for alternating phase-shift masks

Jason M. Benz

doi:10.1117/12.373360

30 December 1999 Defect sensitivity and inspectability of the KLA SEMSpec for alternating phase-shift masks

Jason M. Benz

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373360
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

Defect inspection and repair have been the most challenging aspect for manufacturing implementation and fabrication of alternating phase-shift technology. Optical inspection tools have difficulty detecting quartz defects because no substantial transmission difference exists between the quartz substrate and the phase-shifted regions. The presence of the phase transition regions also adds problems for optical tools by creating false defects, decreased sensitivity, or additional data sets. The following report explores the sensitivity of the KLA SEMSpec to several defect types, and sizes. The non-optical SEMSpec demonstrates some advantage over optical tools when detecting quartz, or phase defects. In contrast, the SEMSpec fails to match optical tools when considering chrome, or opaque defects. Several inspectability issues such as copper defects, and tri-tones also arise for each inspection technique which hampers manufacturability.

Citation Download Citation

Jason M. Benz "Defect sensitivity and inspectability of the KLA SEMSpec for alternating phase-shift masks", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373360

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