Mathematical model for optimizing a laser-induced photopolymerization process

Raja Nassar; Michael J. Vasile; James L. Maxwell

doi:10.1117/12.360462

3 September 1999 Mathematical model for optimizing a laser-induced photopolymerization process

Raja Nassar, Michael J. Vasile, James L. Maxwell

Proceedings Volume 3875, Materials and Device Characterization in Micromachining II; (1999) https://doi.org/10.1117/12.360462
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States

Abstract

Laser induced photo-polymerization is rapid prototyping technique for the manufacturing of high aspect ratio micro- mechanical parts. The process consists of UV laser-induced polymerization of multifunctional monomers. This photo- forming method has advantages of speed and economy over other methods used in the manufacturing of high aspect ratio microstructures. However, current photo-forming systems do not yet have the accuracy and resolution required for micro- mechanical fabrication. To achieve a system with high resolution, it is desirable to develop a predictive mathematical model that can be used in process optimization. In this study, we develop a mathematical model that predicts the laser beam pixel dwell time (or the scanning scheme) on the monomer layer for attaining uniform monomer conversion or solidification by which one can achieve dimensional accuracy and smooth surfaces of the microstructure.

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Raja Nassar, Michael J. Vasile, and James L. Maxwell "Mathematical model for optimizing a laser-induced photopolymerization process", Proc. SPIE 3875, Materials and Device Characterization in Micromachining II, (3 September 1999); https://doi.org/10.1117/12.360462

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KEYWORDS

Mathematical modeling

Polymerization

Solids

Polymers

Light scattering

Photopolymerization

Laser processing

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