Paper
3 March 2000 ODIF for stack filters
Sari Peltonen, Pauli Kuosmanen
Author Affiliations +
Proceedings Volume 3961, Nonlinear Image Processing XI; (2000) https://doi.org/10.1117/12.379382
Event: Electronic Imaging, 2000, San Jose, CA, United States
Abstract
In this paper we study robustness of stack filters by using a recently introduced method called output distributional influence function (ODIF). Unlike the traditionally used methods, such as the influence function and the change-of- variance function, the ODIF provides information about the robustness of finite length filters. So the ODIF is not only a good theoretical analysis tool but it can also be used in real filtering situations for selecting filters behaving as desired in the presence of contamination. We present the ODIFs for the independent but not identically distributed inputs which can be used, e.g., to study the robustness against outliers in linearly increasing or decreasing signals. For independent and identically distributed inputs there are three practical expressions for the output distribution of a stack filter and thus for that case we present three alternative expressions also for the ODIFs. The usefulness of the ODIF in the analysis of the robustness of different stack filters is demonstrated in several illustrative examples by using the ODIFs for the expectation and the variance giving local robustness of the value and the variance, respectively. We also present how to obtain in a straightforward manner the ODIFs for the duals of the stack filters.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sari Peltonen and Pauli Kuosmanen "ODIF for stack filters", Proc. SPIE 3961, Nonlinear Image Processing XI, (3 March 2000); https://doi.org/10.1117/12.379382
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KEYWORDS
Digital filtering

Contamination

Antimony

Fourier transforms

Statistical analysis

Filtering (signal processing)

Nonlinear filtering

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