Quantifying the dynamics of lithography tool support systems

Daniel D. Mootz; Andrew H. Barada

doi:10.1117/12.405234

24 October 2000 Quantifying the dynamics of lithography tool support systems

Daniel D. Mootz, Andrew H. Barada

Proceedings Volume 4093, Current Developments in Lens Design and Optical Systems Engineering; (2000) https://doi.org/10.1117/12.405234
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Optimum performance of a scanning photolithography tool is highly dependent upon the characteristics of its installation support system. Since the quality of the imaging product relies on precise control of the imaging process, vibration management is critical . Stiffness, mass, and inherent damping of the overall support system are the primary factors in determining whether the equipment is able to provide good process control under varied operating conditions. Current generation lithography scanners employ internal reaction forces to ultimately stabilize their optical exposure systems. These reaction forces are generated in order to counteract dynamic acceleration forces resulting from stages, wafer loaders and other devices and can transmit relatively large dynamic loads into the support system. In addition to withstanding the static weight of the tool, the support system must also resist these dynamic loads. Although there are several techniques for establishing the integrity of a support system, this paper will discuss a method for gauging how a system reacts dynamically to the loads generated by a scanning lithography tool. By computing the transfer function of acceleration divided by force, a dynamic measurement term called accelerance is used to quantify the integrity of the pedestal support system on which the tool resides.

Citation Download Citation

Daniel D. Mootz and Andrew H. Barada "Quantifying the dynamics of lithography tool support systems", Proc. SPIE 4093, Current Developments in Lens Design and Optical Systems Engineering, (24 October 2000); https://doi.org/10.1117/12.405234

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