Novel technique of thin photoresist micromachining for submillimeter wave circuits

Wai Yip Liu; A. Harkar

doi:10.1117/12.395639

15 August 2000 Novel technique of thin photoresist micromachining for submillimeter wave circuits

Wai Yip Liu, A. Harkar

Proceedings Volume 4176, Micromachined Devices and Components VI; (2000) https://doi.org/10.1117/12.395639
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States

Abstract

This paper demonstrates a novel technique of microfabrication for sub- millimeter waves circuits. The proposed technique enables E-plane high Q filters, low loss transitions and directional couplers to be formed for operating frequencies about W-band. The overall processing includes realization of ultra-thin E-plane components and rectangular waveguides with a think positive photoresist (known as SU8) onto a metal block that has been mechanically milled with standard flanges. The thickness of the E-plane substrate made with this methodology can be tailored down to a few microns. The measured insertion losses of an E-plane transmission line is typically below 0.1 dB per millimeter and the guide wavelength was found to be very close to the free-space wavelength. The methodology to achieve a thickness of dielectric substrate below ten microns also enables a transmission line of less than 30 ohm to realized with negligible losses. In addition, by glowing a conducting photoresist layer with precise thickness onto an oversize waveguide channel, it is possible to attain a re-scaled waveguide operating at submillimeter wave frequencies. In this paper, the this technique is first presented with particular reference given to the requirement of submillimeter wave applications. Our recent measurements is then given to substantiate the presentation.

Citation Download Citation

Wai Yip Liu and A. Harkar "Novel technique of thin photoresist micromachining for submillimeter wave circuits", Proc. SPIE 4176, Micromachined Devices and Components VI, (15 August 2000); https://doi.org/10.1117/12.395639

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available