Paper
18 August 2000 Automated OPC optimization using in-line CD-SEM
Bo Su, Mina Menaker, Nadav Haas, Ramkumar Subramanian, Bhanwar Singh
Author Affiliations +
Abstract
Optical Proximity Correction (OPC) through assisted features in masks is one of the resolution enhancement techniques in advanced optical lithography. When printing sub-wavelength features on a wafer, OPC becomes necessary. Since OPC is process dependent, it is no easy task to find optimized OPC level for specific lithography process with either rule based or model based OPC application. To benefit from OPC in aggressive gate geometry, the level of correction needs to be optimized. We propose a practical method in OPC optimization using a CD-SEM. During the early process development phase, a test mask can be generated with various levels of OPC correction on a typical feature to be monitored during and after process development. A test wafer is the processed using the test mask using pre-determined photo process. A series of SEM images of the OPC feature on the test wafer will be automatically acquired by a CD-SEM. An OPC optimization algorithm will analyze the acquired images and find contour edges of those images. The contours from those images will be then overlaid on top of each other. With ideal feature shape as a reference, the closest contour to the ideal feature represents the optimized OPC among those tested OPC levels. The selected OPC, not only takes into account of optical effect from scanner optics, but also resist related effects. Production masks can then be produced with the selected level of OPC to maximize the benefit. In this paper, we will demonstrate the above- proposed OPC optimization process.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bo Su, Mina Menaker, Nadav Haas, Ramkumar Subramanian, and Bhanwar Singh "Automated OPC optimization using in-line CD-SEM", Proc. SPIE 4181, Challenges in Process Integration and Device Technology, (18 August 2000); https://doi.org/10.1117/12.395714
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Optical proximity correction

Photomasks

Semiconducting wafers

Wafer testing

Lithography

Optical lithography

Optimization (mathematics)

RELATED CONTENT

Proteus SMO for process window improvement
Proceedings of SPIE (March 23 2020)
Feasibility study of TaSiOx type Att PSM for 157 nm...
Proceedings of SPIE (August 01 2002)
Focus latitude optimization for model-based OPC
Proceedings of SPIE (December 17 2003)

Back to Top