Subtractive defect repair via nanomachining

Mark R. Laurance

doi:10.1117/12.410683

22 January 2001 Subtractive defect repair via nanomachining

Mark R. Laurance

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410683
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

The roadmap to develop smaller and smaller critical dimensions on photomasks has predicated the need for new technologies that can facilitate the repair on a scale that to date has proven difficult to achieve by conventional repai tools. RAVE has developed a novel technology that has application for subtractive repair of defects at and belo the 130 nm design rule.

Citation Download Citation

Mark R. Laurance "Subtractive defect repair via nanomachining", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410683

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