Laser-produced plasma (LPP) scale-up and commercialization

Richard H. Moyer; Harry Shields; Armando Martos; Steven W. Fornaca; Randall J. St. Pierre; Michael B. Petach

doi:10.1117/12.436654

20 August 2001 Laser-produced plasma (LPP) scale-up and commercialization

Richard H. Moyer, Harry Shields, Armando Martos, Steven W. Fornaca, Randall J. St. Pierre, Michael B. Petach

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436654
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

An EUV light source, created when a high-average power (750 W) Nd:YAG laser forms a plasma in a xenon liquid-spray jet, has been characterized. This source has shown improved conversion from laser to EUV, and a more uniform angular distribution, as the laser pulse energy and average power are increased. System performance has been analyzed and compared with the requirements for future EUV microlithography tools for semiconductor manufacturing. EUV power scaling requirements and factors influencing Cost-of-Ownership are discussed.

Citation Download Citation

Richard H. Moyer, Harry Shields, Armando Martos, Steven W. Fornaca, Randall J. St. Pierre, and Michael B. Petach "Laser-produced plasma (LPP) scale-up and commercialization", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436654

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