Simulation-enabled decision making in advanced lithographic manufacturing

Christopher J. Progler

doi:10.1117/12.425236

26 April 2001 Simulation-enabled decision making in advanced lithographic manufacturing

Christopher J. Progler

Proceedings Volume 4404, Lithography for Semiconductor Manufacturing II; (2001) https://doi.org/10.1117/12.425236
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom

Abstract

Spatial modeling methods to improve manufacturing implementation and evaluate process capability are described. The basic elements of the simulation environment are developed and applied to answer real world manufacturing questions on process transfer risks, exposure system quality and paths to improving manufacturing performance. The hidden value in process and tool characterization data is leveraged through predictive modeling techniques and the eventual ink of advanced modeling to process control on the manufacturing line is anticipated. This paper is written in survey fashion offering examples, suggestions and references for those interested in developing or improving a simulation infrastructure for lithographic manufacturing.

Citation Download Citation

Christopher J. Progler "Simulation-enabled decision making in advanced lithographic manufacturing", Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); https://doi.org/10.1117/12.425236

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