Complete analysis of photoelastic fringe patterns using two wavelengths

Terry Y. Chen; S. H. Tsao; H. L. Lee

doi:10.1117/12.468855

29 May 2002 Complete analysis of photoelastic fringe patterns using two wavelengths

Terry Y. Chen, S. H. Tsao, H. L. Lee

Proceedings Volume 4537, Third International Conference on Experimental Mechanics; (2002) https://doi.org/10.1117/12.468855
Event: Third International Conference on Experimental Mechanics, 2002, Beijing, China

Abstract

A new approach for whole-field digital determination of isoclinic angle and total isochromatic fringe order is presented. The method uses a plan polariscope with two different filters to calculate the photoelastic parameters, and to compensate the influence of the isochromatic fringes on the isoclinic pattern. The method allows for the determination of whole-field fringe orders without zero-order fringes.

Citation Download Citation

Terry Y. Chen, S. H. Tsao, and H. L. Lee "Complete analysis of photoelastic fringe patterns using two wavelengths", Proc. SPIE 4537, Third International Conference on Experimental Mechanics, (29 May 2002); https://doi.org/10.1117/12.468855

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