ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Jerry Xiaoming Chen; John Riddick; Matt J. Lamantia; Azeddine Zerrade; Robert K. Henderson; Greg P. Hughes; Cyrus Emil Tabery; Khoi A. Phan; Chris A. Spence; Amy A. Winder; William A. Stanton; Eugene A. Delarosa; John G. Maltabes; Cecilia E. Philbin; Lloyd C. Litt; Anthony Vacca; Scott Pomeroy

doi:10.1117/12.458362

11 March 2002 ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Jerry Xiaoming Chen, John Riddick, Matt J. Lamantia, Azeddine Zerrade, Robert K. Henderson, Greg P. Hughes, Cyrus Emil Tabery, Khoi A. Phan, Chris A. Spence, Amy A. Winder, William A. Stanton, Eugene A. Delarosa, John G. Maltabes, Cecilia E. Philbin, Lloyd C. Litt, Anthony Vacca, Scott Pomeroy

Author Affiliations +

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458362
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

Repair and printability of 193nm alternating aperture phase shift masks have been studied in detail in an effort to understand the overall production capability of these masks for wafer production at the 100nm node and below.

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Jerry Xiaoming Chen, John Riddick, Matt J. Lamantia, Azeddine Zerrade, Robert K. Henderson, Greg P. Hughes, Cyrus Emil Tabery, Khoi A. Phan, Chris A. Spence, Amy A. Winder, William A. Stanton, Eugene A. Delarosa, John G. Maltabes, Cecilia E. Philbin, Lloyd C. Litt, Anthony Vacca, and Scott Pomeroy "ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458362

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