Zep process optimization for sub-micron reticle fabrication in high-acceleration voltage writing tool

Junsik S. Cho; Lee-Ju Kim; Cheol Shin

doi:10.1117/12.458349

11 March 2002 Zep process optimization for submicron reticle fabrication in high-acceleration voltage writing tool

Junsik S. Cho, Lee-Ju Kim, Cheol Shin

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458349
Event: Photomask 2001, 2001, Monterey, CA, United States

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Junsik S. Cho, Lee-Ju Kim, and Cheol Shin "Zep process optimization for submicron reticle fabrication in high-acceleration voltage writing tool", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458349

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