Nanofabrication processes for single-ion implantation of silicon quantum computer devices

Rita P. McKinnon; Fay E. Stanley; Tilo Markus Buehler; Eric Gauja; Katia Peceros; Linda D. Macks; Mladen Mitic; Victor Chan; Andrew S. Dzurak; Robert G. Clark; Changyi Yang; David N. Jamieson; Steven D. Prawer

doi:10.1117/12.454618

19 November 2001 Nanofabrication processes for single-ion implantation of silicon quantum computer devices

Rita P. McKinnon, Fay E. Stanley, Tilo Markus Buehler, Eric Gauja, Katia Peceros, Linda D. Macks, Mladen Mitic, Victor Chan, Andrew S. Dzurak, Robert G. Clark, Changyi Yang, David N. Jamieson, Steven D. Prawer

Author Affiliations +

Proceedings Volume 4590, BioMEMS and Smart Nanostructures; (2001) https://doi.org/10.1117/12.454618
Event: International Symposium on Microelectronics and MEMS, 2001, Adelaide, Australia

Abstract

We describe progress in a range of nanofabrication processes for the production of silicon-based quantum computer devices. The processes are based upon single-ion implantation to place phosphorus-31 atoms in accurate locations, precisely self-aligned to metal control gates. These fabrication schemes involve multi-layer resist and metal structures, electron beam lithography and multi-angled aluminium shadow evaporation. The key feature of all fabrication schemes is a gate pattern defined in a resist structure using electron beam lithography, used in conjunction with a second pattern written in another resist layer. The locations where the two patterns overlap define channels down to the substrate through which ions can be implanted, with the remaining metal/resist structure behaving as a mask. Further processing on the resist structures allows for deposition of the control gates and read-out structures. Central to this process is a new technique which allows for control of the implantation process at a single-ion level.

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Rita P. McKinnon, Fay E. Stanley, Tilo Markus Buehler, Eric Gauja, Katia Peceros, Linda D. Macks, Mladen Mitic, Victor Chan, Andrew S. Dzurak, Robert G. Clark, Changyi Yang, David N. Jamieson, and Steven D. Prawer "Nanofabrication processes for single-ion implantation of silicon quantum computer devices", Proc. SPIE 4590, BioMEMS and Smart Nanostructures, (19 November 2001); https://doi.org/10.1117/12.454618

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