An Analysis Of Pellicle Parameters For Step-And-Repeat Projection

Alex Flamholz

doi:10.1117/12.941903

29 June 1984 An Analysis Of Pellicle Parameters For Step-And-Repeat Projection

Alex Flamholz

Proceedings Volume 0470, Optical Microlithography III: Technology for the Next Decade; (1984) https://doi.org/10.1117/12.941903
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

Pellicles are thin transparent membranes of high optical quality that are placed on one or both sides of an IC circuit mask to protect the mask and to prevent any particulate defect falling onto the mask from affecting the printed image [1]. Pellicles have been successfully utilized in production with 1:1 scanning systems and have given measureable improvements in yield [2].

Citation Download Citation

Alex Flamholz "An Analysis Of Pellicle Parameters For Step-And-Repeat Projection", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); https://doi.org/10.1117/12.941903

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