Liquid-Phase Laser Surface Modification

Terence Donohue

doi:10.1117/12.943112

28 June 1984 Liquid-Phase Laser Surface Modification

Terence Donohue

Proceedings Volume 0482, Applications of Laser Chemistry & Diagnostics; (1984) https://doi.org/10.1117/12.943112
Event: 1984 Technical Symposium East, 1984, Arlington, United States

Abstract

Several laser-controlled thermal and photochemical processes at liquid/solid interfaces are described. These include etching of silicon dioxide and copper in a number of aqueous and organic solvents. Reactions range from simple, thermally-enhanced types to photo-chemically sensitized systems. Advantages and limitations of the liquid phase in surface processing are discussed.

Citation Download Citation

Terence Donohue "Liquid-Phase Laser Surface Modification", Proc. SPIE 0482, Applications of Laser Chemistry & Diagnostics, (28 June 1984); https://doi.org/10.1117/12.943112

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