High-resolution index of refraction profiling of optical waveguides

Roderick S. Taylor; Cyril Hnatovsky

doi:10.1117/12.473921

17 February 2003 High resolution index of refraction profiling of optical waveguides

Roderick S. Taylor, Cyril Hnatovsky

Proceedings Volume 4833, Applications of Photonic Technology 5; (2003) https://doi.org/10.1117/12.473921
Event: Applications of Photonic Technology 5, 2002, Quebec City, Canada

Abstract

A comparison is made between three high spatial resolution index of refraction profiling techniques:reflection-NSOM, microreflection and AFM plus selective chemical etching using the very small elliptical core of a polarization maintaining E-fiber from Andrew Corporation as a test waveguide.

Citation Download Citation

Roderick S. Taylor and Cyril Hnatovsky "High resolution index of refraction profiling of optical waveguides", Proc. SPIE 4833, Applications of Photonic Technology 5, (17 February 2003); https://doi.org/10.1117/12.473921

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