Nickel nanoparticles dispersed in SiO2 fabricated by high-flux negative-ion implantation of 60 keV

Hiroshi Amekura; Hideaki Kitazawa; Takashi Mochiku; Naoki Umeda; Yoshihiko Takeda; Naoki Kishimoto

doi:10.1117/12.469676

13 November 2002 Nickel nanoparticles dispersed in SiO₂ fabricated by high-flux negative-ion implantation of 60 keV

Hiroshi Amekura, Hideaki Kitazawa, Takashi Mochiku, Naoki Umeda, Yoshihiko Takeda, Naoki Kishimoto

Proceedings Volume 4936, Nano- and Microtechnology: Materials, Processes, Packaging, and Systems; (2002) https://doi.org/10.1117/12.469676
Event: SPIE's International Symposium on Smart Materials, Nano-, and Micro- Smart Systems, 2002, Melbourne, Australia

Abstract

The magnetic nanoparticles are fabricated in silica glass (SiO₂) using high-flux implantation of nickel negative-ions of 60 keV. Photo-absorption measurements and the cross-sectional transmission electron microscopy (XTEM) observation confirm formation of metallic Ni nanoparticles in SiO₂, and exclude possible formation of Ni silicides (Ni₃Si, Ni₂Si, NiSi) and oxides (NiO) as major products. The mean diameter of the nanoparticles was in ~2.9 nm, and the depth distribution was similar to the prediction from the TRIDYN code with taking account of the sputtering. Temperature- and field- dependences of magnetization show that the nanoparticles are in the super-paramagnetic state with a blocking temperature of ~27 K.

Citation Download Citation

Hiroshi Amekura, Hideaki Kitazawa, Takashi Mochiku, Naoki Umeda, Yoshihiko Takeda, and Naoki Kishimoto "Nickel nanoparticles dispersed in SiO₂ fabricated by high-flux negative-ion implantation of 60 keV", Proc. SPIE 4936, Nano- and Microtechnology: Materials, Processes, Packaging, and Systems, (13 November 2002); https://doi.org/10.1117/12.469676

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