Paper
22 July 2003 Processing and electrical characterization in intrinsic conducting polymers for electronic and MEMS applications
Wilhelm Seifert, Henrik Albrecht, Stephan Mietke, Thomas Koehler, Matthias Werner
Author Affiliations +
Abstract
Electronic polymer devices and test structures based on PEDOT/PSS were fabricated in a fully CMOS compatible process. The resistivity of PEDOT/PSS polymer films is dependent on film thickness. The resistivity increases with decreasing film thickness for polymer film thicknesses between 190 nm and 380 nm. The resistivity differs by a factor of ~3 depending on film thickness. The evaluation of the specific contact resistivity depending on the choice of the metallization leads to a difference of the specific contact resistivity by a factor of 190. The specific contact resistivity does not follow the Schottky-Mott law and thus indicates a non-ideal behavior of the metal PEDOT/PSS interface. The lowest average specific contact resistivity was obtained for silver with an average value of 0.14 Ωcm2 and the highest specific contact resistivity was obtained for platinum. Even the lowest specific contact resistivity for silver is still very high when compared with low resistivity ohmic contacts to silicon. However, the specific contact resistivity is expected to have a significant drawback for overall device performance. Possible future applications of MEMS and electronics based on polymers will be for simple devices like transistors, ID tags, thermistors, acceleration and pressure sensors as well as radiation and UV detectors.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wilhelm Seifert, Henrik Albrecht, Stephan Mietke, Thomas Koehler, and Matthias Werner "Processing and electrical characterization in intrinsic conducting polymers for electronic and MEMS applications", Proc. SPIE 5045, Testing, Reliability, and Application of Micro- and Nano-Material Systems, (22 July 2003); https://doi.org/10.1117/12.484280
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Cited by 4 scholarly publications.
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KEYWORDS
Polymers

Resistance

Metals

Microelectromechanical systems

Silver

Photoresist materials

Silicon

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