Novel CVD technique for deposition of oxide films for sensors

S. Roy; S. Basu

doi:10.1117/12.514622

14 October 2003 Novel CVD technique for deposition of oxide films for sensors

S. Roy, S. Basu

Proceedings Volume 5062, Smart Materials, Structures, and Systems; (2003) https://doi.org/10.1117/12.514622
Event: Smart Materials, Structures, and Systems, 2002, Bangalore, India

Abstract

A modified-CVD method was developed to deposit thin films of oxides for device applications. ZnO thin films were deposited on various substrates after optimizing the growth parameters. The quality of the ZnO films was investigated using x-ray diffraction and scanning electron microscopy. The same ZnO film deposited on quartz substrate has been used for sensing hydrogen gas at 400°C.

Citation Download Citation

S. Roy and S. Basu "Novel CVD technique for deposition of oxide films for sensors", Proc. SPIE 5062, Smart Materials, Structures, and Systems, (14 October 2003); https://doi.org/10.1117/12.514622

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