Principles and applications of laser-induced liquid-phase jet-chemical etching

Andreas Stephen; Simeon Metev; Frank Vollertsen

doi:10.1117/12.540525

18 November 2003 Principles and applications of laser-induced liquid-phase jet-chemical etching

Andreas Stephen, Simeon Metev, Frank Vollertsen

Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540525
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany

Abstract

In this treatment method laser radiation, which is guided from a coaxially expanding liquid jet-stream, locally initiates a thermochemical etching reaction on a metal surface, which leads to selective material removal at high resolution and quality of the treated surface as well as low thermal influence on the workpiece. Electrochemical investigations were performed under focused laser irradiation using a cw-Nd:YAG laser with a maximum power of 15 W and a simultaneous impact of the liquid jet-stream consisting of phosphoric acid with a maximum flow rate of 20 m/s. The time resolved measurements of the electrical potential difference against an electrochemical reference electrode were correlated with the specific processing parameters and corresponding etch rates to identify processing conditions for temporally stable and enhanced chemical etching reactions. Applications of laser-induced liquid-phase jet-chemical etching in the field of sensor technology, micromechanics and micrmoulding technology are presented. This includes the microstructuring of thin film systems, cutting of foils of shape memory alloys or the generation of structures with defined shape in bulk material.

Citation Download Citation

Andreas Stephen, Simeon Metev, and Frank Vollertsen "Principles and applications of laser-induced liquid-phase jet-chemical etching", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); https://doi.org/10.1117/12.540525

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