Characterizing surface roughness of thin films by polarized light scattering

Thomas A. Germer; Michael J. Fasolka

doi:10.1117/12.506909

4 November 2003 Characterizing surface roughness of thin films by polarized light scattering

Thomas A. Germer, Michael J. Fasolka

Proceedings Volume 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies; (2003) https://doi.org/10.1117/12.506909
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

The polarization of light scattered by the surface of a material contains information that can be used to identify the sources of that scatter. In this paper, first order vector perturbation theory for light scattering from interfacial roughness of a dielectric layer is reviewed. In addition, methods for calculating the Stokes vector for scatter from multiple sources and for decomposing a Stokes vector into contributions from two non-depolarizing scattering sources are provided. The polarization of light scattered from interfacial roughness depends upon the relative roughness of the two interfaces and the degree of phase correlation between the two interfaces. Experimental results are presented for three cases: a nominally conformal film, a nominally anticonformal film, and a lateral offset roughness film. The method works well for the nearly conformal film. Difficulties that arise for the other two cases are discussed.

Citation Download Citation

Thomas A. Germer and Michael J. Fasolka "Characterizing surface roughness of thin films by polarized light scattering", Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); https://doi.org/10.1117/12.506909

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