Paper
10 June 2004 Photothermal multipixel imaging microscope
Christopher J. Stolz, Diane J. Chinn, Robert D. Huber, Carolyn L. Weinzapfel, Zhouling Wu
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Abstract
Photothermal microscopy is a useful nondestructive tool for the identification of fluence-limiting defects in optical coatings. Traditional photothermal microscopes are single-pixel detection devices. Samples are scanned under the microscope to generate a defect map. For high-resolution images, scan times can be quite long (1 mm2 per hour). Single-pixel detection has geen used traditionally because of the ease in separating the laser-induced topographical change due to defect absorption from the defect surface topography. This is accomplished by using standard chopper and lock-in amplifier techniques to remove the DC signal. Multi-pixel photothermal microscopy is now possible by utilizing an optical lock-in technique. This eliminates the lock-in amplifier and enables the use of a CCD camera with an optical lock in for each pixel. With this technique, the data acquisition speed can be increased by orders of magnitude depending on laser power, beam size, and pixel density.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher J. Stolz, Diane J. Chinn, Robert D. Huber, Carolyn L. Weinzapfel, and Zhouling Wu "Photothermal multipixel imaging microscope", Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); https://doi.org/10.1117/12.523669
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CITATIONS
Cited by 6 scholarly publications.
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KEYWORDS
Microscopes

Coating

Microscopy

Data acquisition

Laser beam diagnostics

Absorption

Optical amplifiers

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