Particle-cluster tin target for a high-conversion efficiency LPP source for EUVL

Toshihisa Tomie; Tatsuya Aota; Jing Quan Lin; Yoshifumi Ueno; Hidehiko Yashiro; Noriaki Kandaka; Hiroki Moriwaki; Gohta Niimi; Isao Matsushima; Kentaro Nishigori

doi:10.1117/12.535395

20 May 2004 Particle-cluster tin target for a high conversion efficiency LPP source for EUVL

Toshihisa Tomie, Tatsuya Aota, Jing Quan Lin, Yoshifumi Ueno, Hidehiko Yashiro, Noriaki Kandaka, Hiroki Moriwaki, Gohta Niimi, Isao Matsushima, Kentaro Nishigori

Author Affiliations +

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.535395
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Particle-cluster tin target is presented as the solution of a 100W EUV source for EUVL. Theory for maximizing conversion efficiency of a laser-produced plasma is derived and the theory is experimentally confirmed by using a dispersed SnO₂ particles. The EUV intensity 4 times higher than that from a plasma on a solid Sn plate target is observed at the optimized density. The achieved conversion efficiency for dispersed particles is estimated to be as high as 3%/(2π str 2%BW) or higher from the value for a Sn plate of 0.8% measured by using two multilayer mirrors and a calibrated photodiode. Theoretical consideration reveals that larger diameter plasma enables higher EUV power. The particle-cluster can be delivered at multi kHz rep-rate by using water droplet. Experimental confirmation of delivering particles by droplets is also reported.

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Toshihisa Tomie, Tatsuya Aota, Jing Quan Lin, Yoshifumi Ueno, Hidehiko Yashiro, Noriaki Kandaka, Hiroki Moriwaki, Gohta Niimi, Isao Matsushima, and Kentaro Nishigori "Particle-cluster tin target for a high conversion efficiency LPP source for EUVL", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.535395

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