Photomask clear defects repair using ultrafast laser technology

Guy Ben-Zvi; Nikolay Guletsky; Vladimir J. Dmitriev; Sergey V. Oshemkov; Eitan Zait

doi:10.1117/12.557733

20 August 2004 Photomask clear defects repair using ultrafast laser technology

Guy Ben-Zvi, Nikolay Guletsky, Vladimir J. Dmitriev, Sergey V. Oshemkov, Eitan Zait

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557733
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

The applicability of ultrafast laser 3D machining of transparent objects for photomask clear defects repair is investigated. The technology is based on patterning 3D shading elements inside quartz body of the photomask at the vicinity of clear defects in chrome layer, which effectively blocks the light for the duration of the photolithography process. Shading elements consist of an array of breakdown points in quartz, produced as a result of laser-induced breakdown and arranged in accordance with the size and location of the defects. Thresholds of bulk breakdown and chrome removal at laser irradiation from the back side of the photomask and their dependence on the pulse energy and height of focal point under chrome layer were obtained. Optical density of the shading element depends on the laser pulse energy, distance between breakdown points, the number of layers and the size of the shading element itself. To increase optical density multi layer shading elements were created. Ultrafast laser technology and a tool for photomask clear defects repair are described.

Citation Download Citation

Guy Ben-Zvi, Nikolay Guletsky, Vladimir J. Dmitriev, Sergey V. Oshemkov, and Eitan Zait "Photomask clear defects repair using ultrafast laser technology", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557733

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