Mapping of localized surface plasmon fields via exposure of a photosensitive polymer

Anna Rumyantseva; Sergei Kostcheev; Johan Grand; Christophe Hubert; Renaud Bachelot; Gilles Lerondel; Pierre Michel Adam; Pascal Royer

doi:10.1117/12.550100

15 September 2004 Mapping of localized surface plasmon fields via exposure of a photosensitive polymer

Anna Rumyantseva, Sergei Kostcheev, Johan Grand, Christophe Hubert, Renaud Bachelot, Gilles Lerondel, Pierre Michel Adam, Pascal Royer

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Proceedings Volume 5450, Photonic Crystal Materials and Nanostructures; (2004) https://doi.org/10.1117/12.550100
Event: Photonics Europe, 2004, Strasbourg, France

Abstract

We present a method for mapping the electromagnetic field distribution in the vicinity of noble metal nanoparticles able to sustain localised surface plasmon resonance (LSPR). The field distribution is coded by topographic change in a self-developing photosensitive polymer (PMMA-DR1). Metallic nanostructures are fabricated by e-beam lithography and optically characterised by extinction spectroscopy. Photoinduced topographic changes are checked by means of atomic force microscopy (AFM). The dipolar character of the surface modification around the particles agrees qualitatively with theoretical predictions and a strong correlation between LSPR position and the relief depth is found.

Citation Download Citation

Anna Rumyantseva, Sergei Kostcheev, Johan Grand, Christophe Hubert, Renaud Bachelot, Gilles Lerondel, Pierre Michel Adam, and Pascal Royer "Mapping of localized surface plasmon fields via exposure of a photosensitive polymer", Proc. SPIE 5450, Photonic Crystal Materials and Nanostructures, (15 September 2004); https://doi.org/10.1117/12.550100

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KEYWORDS

Polymers

Particles

Near field optics

Silver

Polarization

Atomic force microscopy

Refractive index

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