Multilayer optics for Mo-radiation-based crystallography

Arjen B. Storm; Carsten Michaelsen; Alexandra Oehr; Christian Hoffmann

doi:10.1117/12.557153

3 November 2004 Multilayer optics for Mo-radiation-based crystallography

Arjen B. Storm, Carsten Michaelsen, Alexandra Oehr, Christian Hoffmann

Proceedings Volume 5537, X-Ray Sources and Optics; (2004) https://doi.org/10.1117/12.557153
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

We present an optic for laboratory Mo-Kalpha single crystal diffraction systems. The optic is comprised of two elliptically bent focusing multilayers, which are arranged in the Montel scheme. The paper shows the design and performance of the optic. A comparison with a graphite monochromator shows a five-fold intensity enhancement. Especially small and weakly diffracting crystals benefit from the large intensity produced by the optic, as illustrated by diffraction analyses.

Citation Download Citation

Arjen B. Storm, Carsten Michaelsen, Alexandra Oehr, and Christian Hoffmann "Multilayer optics for Mo-radiation-based crystallography", Proc. SPIE 5537, X-Ray Sources and Optics, (3 November 2004); https://doi.org/10.1117/12.557153

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