Image-based metrology software for analysis of features on masks and wafers

Saghir Munir; Daniel J. Bald; Vikram Tolani; Horst Haussecker

doi:10.1117/12.569135

6 December 2004 Image-based metrology software for analysis of features on masks and wafers

Saghir Munir, Daniel J. Bald, Vikram Tolani, Horst Haussecker

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569135
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

Tebaldi is a software tool developed at Intel Mask Operation (IMO) for quantitatively analyzing patterns in 2D. Its initial scope was to analyze aerial images taken with a microscope. However the software has recently been enhanced to support aerial images obtained through simulation, bitmap, jpeg and tiff files saved from the mask inspection systems and the scanning electron microscope (SEM). This article primarily focuses on the SEM module of the software. Tebaldi supports simulated aerial images generated through IMO’s simulation based defect disposition system. This allows engineers to directly correlate 2D structures in an experimental aerial image, with those in a simulated image. To analyze SEM images, the software features scaling, alignment and calibration functions. Several linear and non-linear filtration techniques to reduce noise and charging exist. Custom convolution kernels can be user defined. Ability to segment features and extract contours also exist. Further, these contours can be overlayed and shortest distances between corresponding points can be computed in a user friendly manner with a high degree of confidence. Tebaldi is currently used in production to disposition defects in repaired sites on masks shipped from IMO as well as to compare SEM images to determine the pattern fidelity across mask writers and processes within IMO.

Citation Download Citation

Saghir Munir, Daniel J. Bald, Vikram Tolani, and Horst Haussecker "Image-based metrology software for analysis of features on masks and wafers", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569135

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available