Mask defect reduction through automated pellicle mounting

Richard E. Wistrom; Dennis Hayden; Timothy Neary

doi:10.1117/12.569061

6 December 2004 Mask defect reduction through automated pellicle mounting

Richard E. Wistrom, Dennis Hayden, Timothy Neary

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569061
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

At IBM’s Mask House, we deigned, installed, and evaluated a fully automated pellicle mounting tool. Features include very low particulate levels, ability to mount a wide variety of pellicles, ease of operation, and pellicle and mask inspection capability. During an evaluation period, pellicles were mounted both with this fully automated tool and with a semiautomatic tool. The fully automated tool showed good reliability (>95% availability) and a 2X lower incidence of foreign material contemination as compared with the semiautomatic tool.

Citation Download Citation

Richard E. Wistrom, Dennis Hayden, and Timothy Neary "Mask defect reduction through automated pellicle mounting", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569061

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