Secondary RF plasma system for mitigation of EUV source debris and advanced fuels

Michael A. Jaworski; Michael J. Williams; Erik L. Antonsen; Brian E. Jurczyk; David N. Ruzic; Robert Bristol

doi:10.1117/12.600059

6 May 2005 Secondary RF plasma system for mitigation of EUV source debris and advanced fuels

Michael A. Jaworski, Michael J. Williams, Erik L. Antonsen, Brian E. Jurczyk, David N. Ruzic, Robert Bristol

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.600059
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

A 52 MHz RF system has been installed and tested on the IDEAL chamber. The secondary plasma source will be used in conjunction with other methods to mitigate debris from an EUV source. The plasmas are produced by a quarter-wavelength helical resonator antenna contained within a faraday shield. Argon and helium gases have both been tested in the system and have been shown to produce plasmas with densities as high as 8 × 10¹¹ cm^-3 with input powers up to 800 W. Input power to the system is limited by internal geometry and connections to the antenna housing.

Citation Download Citation

Michael A. Jaworski, Michael J. Williams, Erik L. Antonsen, Brian E. Jurczyk, David N. Ruzic, and Robert Bristol "Secondary RF plasma system for mitigation of EUV source debris and advanced fuels", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.600059

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