Unbiased estimation of linewidth roughness

J. S. Villarrubia; B. D. Bunday

doi:10.1117/12.599981

10 May 2005 Unbiased estimation of linewidth roughness

J. S. Villarrubia, B. D. Bunday

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.599981
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Linewidth roughness (LWR) is usually estimated simply as three standard deviations of the linewidth. The effect of image noise upon this metric includes a positive nonrandom component. The metric is therefore subject to a bias or "systematic error" that we have estimated can be comparable in size to the roughness itself for samples as smooth as required by the industry roadmap. We illustrate the problem using scanning electron microscope images of rough lines. We propose simple changes to the measurement algorithm that, if adopted by metrology instrument suppliers, would permit estimation of LWR without bias caused by image noise.

Citation Download Citation

J. S. Villarrubia and B. D. Bunday "Unbiased estimation of linewidth roughness", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.599981

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