ILSim: a compact simulation tool for interferometric lithography

Yongfa Fan; Anatoly Bourov; Lena Zavyalova; Jianming Zhou; Andrew Estroff; Neal Lafferty; Bruce W. Smith

doi:10.1117/12.621286

12 May 2005 ILSim: a compact simulation tool for interferometric lithography

Yongfa Fan, Anatoly Bourov, Lena Zavyalova, Jianming Zhou, Andrew Estroff, Neal Lafferty, Bruce W. Smith

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.621286
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Interference imaging systems are being used more extensively for R&D applications where NA manipulation, polarization control, relative beam attenuation, and other parameters are explored and projection imaging approaches may not exist. To facilitate interferometric lithography research, we have developed a compact simulation tool, ILSim, for studying multi-beam interferometric imaging, including fluid immersion lithography. The simulator is based on full-vector interference theory, which allows for application at extremely high NA values, such as those projected for use with immersion lithography. In this paper, ILSim is demonstrated for use with two-beam and four-beam interferometric immersion lithography. The simulation tool was written with Matlab, where the thin film assembly (ambient, top coat, resist layer, BARC layers, and substrate) and illumination conditions (wavelength, polarization state, interference angle, demodulation, NA) can be defined. The light intensity distributions within the resist film for 1 exposure or 2-pass exposure are displayed in the graph window. It also can optimize BARC layer thickness and top coat thickness.

Citation Download Citation

Yongfa Fan, Anatoly Bourov, Lena Zavyalova, Jianming Zhou, Andrew Estroff, Neal Lafferty, and Bruce W. Smith "ILSim: a compact simulation tool for interferometric lithography", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.621286

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