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16 June 2005 Demonstrators: a vital step forward for projection mask-less lithography (PML2)
Christoph Brandstaetter, Ernst Haugeneder, Hans-Joachim Doering, Thomas Elster, Joachim Heinitz, Olaf Fortagne, Stefan Eder-Kapl, Gertraud Lammer, Peter Jochl, Hans Loeschner, Klaus Reimer, Juergen Saniter, Maati Talmi, Ramona Eberhardt, Klaus Kroenert
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Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637298
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany
Abstract
Electron beam based Projection Mask-Less Lithography (PML2) is one of the promising candidates for fast chip devel-opment and prototyping as well as for small and medium volume device production for the 45nm technology node and beyond. The concept of the PML2 proof-of-concept tool comprises a single electron optical column, a multi beam blank-ing device (programmable "Aperture Plate System") including high speed optical data path and a scanning 300mm wa-fer stage. More than 290.000 beams will be projected onto the wafer used for a highly redundant scanning stripe expo-sure process. The PML2 proof-of-concept tool will be built as part of the European MEDEA+ project T409 and the joint project "Ab-bildungsmethodiken fur nanoelektronische Bauelemente-ABBILD" in Germany. To show the feasibility of PML2 key modules in an early stage several demonstrators and test stands have been developed. In this paper demonstration setups and first results of the electron optics modeling, gun prototype, Aperture Plate System and the Optical Data Path are pre-sented.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Christoph Brandstaetter, Ernst Haugeneder, Hans-Joachim Doering, Thomas Elster, Joachim Heinitz, Olaf Fortagne, Stefan Eder-Kapl, Gertraud Lammer, Peter Jochl, Hans Loeschner, Klaus Reimer, Juergen Saniter, Maati Talmi, Ramona Eberhardt, and Klaus Kroenert "Demonstrators: a vital step forward for projection mask-less lithography (PML2)", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); https://doi.org/10.1117/12.637298
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KEYWORDS
Lithography
Semiconducting wafers
Electron beams
Free space optics
Wafer-level optics
Scintillators
Receivers
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