High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform

Syarhei Avakaw

doi:10.1117/12.637300

16 June 2005 High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform

Syarhei Avakaw

Author Affiliations +

Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637300
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany

Abstract

The paper presents a description of one of the main elements of a new modular automatic reticle defect inspection platform-a defect detection sub-system. This platform is currently under active development at Planar Concern. This paper presents the results of the use of the object-oriented approach which was used in the development of the defect detection algorithms for the die-to-database reticle inspection system. Furthermore, the paper presents briefly the architecture and technology of the new modular automatic reticle inspection platform.

Citation Download Citation

Syarhei Avakaw "High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); https://doi.org/10.1117/12.637300

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