CD measurement of angled lines on high-end masks and its calibration method

Masashi Ataka; Yasunobu Kitayama; Katsuyuki Takahashi; Naoyuki Nakamura; Izumi Santo; Hitomi Satoh; Norimichi Anazawa

doi:10.1117/12.632016

8 November 2005 CD measurement of angled lines on high-end masks and its calibration method

Masashi Ataka, Yasunobu Kitayama, Katsuyuki Takahashi, Naoyuki Nakamura, Izumi Santo, Hitomi Satoh, Norimichi Anazawa

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59924H (2005) https://doi.org/10.1117/12.632016
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

Recently, in Critical Dimension (CD) measurement on high-end masks, Optical Proximity Correction (OPC) pattern measurement is on increase and it has become important to measure angled lines. In CD searching on a CAD layout viewer, the exact CD values can be detected for the OPC patterns because they consist of a lot of rectangles. While, the CD values for angled lines have not been detected in it. Meanwhile the mask Critical Dimension Scanning Electron Microscope (CD-SEM) can measure angled lines, but measurement accuracy cannot be verified because there is no reference standard sample available for calibration of the CD values. In this study, we made the prototype of a standard sample for CD measurement with 0 degree and 45 degree angled lines by using VLSI Standards Inc. Nano Lattice Standard. The shape is the same as 6025 mask. We measured CDs of angled lines of the above sample using Holon EMU-260 and examined the calibration method. We are going to discuss the CD marking method on a CAD layout viewer in order to automate measurement of angled lines in near future.

Citation Download Citation

Masashi Ataka, Yasunobu Kitayama, Katsuyuki Takahashi, Naoyuki Nakamura, Izumi Santo, Hitomi Satoh, and Norimichi Anazawa "CD measurement of angled lines on high-end masks and its calibration method", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59924H (8 November 2005); https://doi.org/10.1117/12.632016

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available