New advances and steam laser cleaning of opaque and transparent critical substrates: with IR-lasers to new laser cleaning mechanism

Shishir Shukla; Sergey Kudryashov; Kevin Lyon; Susan D. Allen

doi:10.1117/12.647017

1 March 2006 New advances and steam laser cleaning of opaque and transparent critical substrates: with IR-lasers to new laser cleaning mechanism

Shishir Shukla, Sergey Kudryashov, Kevin Lyon, Susan D. Allen

Author Affiliations +

Proceedings Volume 6106, Photon Processing in Microelectronics and Photonics V; 610609 (2006) https://doi.org/10.1117/12.647017
Event: Lasers and Applications in Science and Engineering, 2006, San Jose, California, United States

Abstract

Dry and steam laser cleaning, DLC and SLC, of nano-and micro contaminant particles from UV/vis opaque and transparent critical substrates has been studied in front-side laser illumination geometry with the help of time-resolved optical techniques using a nanosecond IR CO2-laser and different energy transfer media (ETM) fluids. In the case of SLC, microscopic details of particle-ETM-substrate interactions in pre-deposited micron-thick ETM layers have been revealed preliminarily by means of time-resolved optical microscopy. Fundamental DLC and SLC mechanisms for removal of nano- and micro-particles from opaque and transparent critical substrates have been determined. Optimal conditions for nearly complete laser cleaning have been chosen for different combinations of contaminating nano- and micro-particles and substrates.

Citation Download Citation

Shishir Shukla, Sergey Kudryashov, Kevin Lyon, and Susan D. Allen "New advances and steam laser cleaning of opaque and transparent critical substrates: with IR-lasers to new laser cleaning mechanism", Proc. SPIE 6106, Photon Processing in Microelectronics and Photonics V, 610609 (1 March 2006); https://doi.org/10.1117/12.647017

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