ZnO thin films prepared by ion beam enhanced deposition method

Ningyi Yuan; Jinhua Liao; Lining Fan; Xiuqing Wang; Yi Zhou

doi:10.1117/12.674297

9 June 2006 ZnO thin films prepared by ion beam enhanced deposition method

Ningyi Yuan, Jinhua Liao, Lining Fan, Xiuqing Wang, Yi Zhou

Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61492U (2006) https://doi.org/10.1117/12.674297
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China

Abstract

Ion beam enhanced deposition method was adopted to prepare In-N co-doped and Al-N co-doped ZnO films on Si, SiO₂ and glass substrates. ZnO mixed with In₂O₃ or Al₂O₃ powder sputtering target was used and during the deposition N+/Ar+ mixed beam with an energy of 40KeV and a beam current of 2mA implanted into the deposited films. The XRD results showed that all polycrystalline In-N and Al-N co-doped ZnO films deposited on Si, SiO2 and glass substrates have a preferred (002) orientation. The as-deposited In-N co-doped ZnO film showed p-type and had a resistivity of 2.4Ωcm on SiO₂ substrate. After annealed in N₂, the lowest resistivity of p type In-N co-doped ZnO films was 0.8Ωcm. While Al-N co-doped ZnO film showed n type.

Citation Download Citation

Ningyi Yuan, Jinhua Liao, Lining Fan, Xiuqing Wang, and Yi Zhou "ZnO thin films prepared by ion beam enhanced deposition method", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61492U (9 June 2006); https://doi.org/10.1117/12.674297

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