Paper
20 March 2006 Benchmark of numerical versus analytical proximity curve calculations
Author Affiliations +
Abstract
For the technology development of microlithography various optical simulation tools are established as a planning and development tool. Depending on the application, various numerical approximation schemes are used to tradeoff accuracy versus speed. Determining the correct numerical setting is often a tricky task as it is a compromise between these two contrary properties. In our study, we compare the numerical accuracy of two optical simulators, Solid-E as a representative for simulators for technology development and Mentor Calibre as design-for-manufacturing and optical proximity correction (OPC) tool. Calibre uses a coherent kernel approximation for performing fast simulations. As a measure for the simulation accuracy, we use the root-mean-square error criterion of a linearity curve compared to an analytical reference simulation.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roderick Köhle, Christof Bodendorf, and Wolfgang Hoppe "Benchmark of numerical versus analytical proximity curve calculations", Proc. SPIE 6154, Optical Microlithography XIX, 61542Q (20 March 2006); https://doi.org/10.1117/12.656884
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KEYWORDS
Solids

System on a chip

Computer simulations

Error analysis

Image resolution

Optical proximity correction

Apodization

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