The buried channel optical waveguides on glass by high electric field technique

Zigang Zhou

doi:10.1117/12.676231

4 October 2006 The buried channel optical waveguides on glass by high electric field technique

Zigang Zhou

Proceedings Volume 6351, Passive Components and Fiber-based Devices III; 635138 (2006) https://doi.org/10.1117/12.676231
Event: Asia-Pacific Optical Communications, 2006, Gwangju, South Korea

Abstract

The buried channel waveguides on optical glass is fabricated by a high electric field technique. The 900V voltage was applied on the glass to accelerate the field-driven ion exchange process by expeditiously replacing host sodium ions in the glass with silver ions. As a result, the lowest optical loss was achieved on waveguides fabricated at 350°C. The optical loss for channel waveguides was measured using the interference technique with a 0.6328μm He-Ne laser. And the loss of 0.30 dB/cm was obtained for channel waveguides of 20μm in depth, relatively low for waveguides of such depth at red wavelength. A nearly Gauss refractive index profile was observed from every channel waveguide fabricated.

Citation Download Citation

Zigang Zhou "The buried channel optical waveguides on glass by high electric field technique", Proc. SPIE 6351, Passive Components and Fiber-based Devices III, 635138 (4 October 2006); https://doi.org/10.1117/12.676231

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