A mechanism for erosion of optics exposed to a laser-generated EUV plasma

Jonathan W. Arenberg; Stuart McNaught; Mark Michaelian; Harry Shields; Dick Moyer; Steve Fornaca; Fernando Martos

doi:10.1117/12.696422

15 January 2007 A mechanism for erosion of optics exposed to a laser-generated EUV plasma

Jonathan W. Arenberg, Stuart McNaught, Mark Michaelian, Harry Shields, Dick Moyer, Steve Fornaca, Fernando Martos

Proceedings Volume 6403, Laser-Induced Damage in Optical Materials: 2006; 64030X (2007) https://doi.org/10.1117/12.696422
Event: Boulder Damage Symposium XXXVIII: Annual Symposium on Optical Materials for High Power Lasers, 2006, Boulder, Colorado, United States

Abstract

This paper introduces a theory for material erosion in proximity to a laser driven EUV source, with a xenon target. The mechanism hypothesized is x-ray induced damage. A semi empirical photo ablation model is developed using the laser induced damage threshold at 1.06 microns to set the critical energy density for material removal. The model also includes absorption of the plasma generated xrays and is shown to agree well with experiment. With the theory validated, the paper concludes with a calculation of a safe operating distance and how this distance could be calculated for other optic materials and plasma targets.

Citation Download Citation

Jonathan W. Arenberg, Stuart McNaught, Mark Michaelian, Harry Shields, Dick Moyer, Steve Fornaca, and Fernando Martos "A mechanism for erosion of optics exposed to a laser-generated EUV plasma", Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 64030X (15 January 2007); https://doi.org/10.1117/12.696422

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