Optical characterization of microstructures of high aspect ratio

T. Tamulevicius; S. Tamulevicius; M. Andrulevicius; G. Janusas; V. Ostasevicius; A. Palevicius

doi:10.1117/12.714245

5 April 2007 Optical characterization of microstructures of high aspect ratio

T. Tamulevicius, S. Tamulevicius, M. Andrulevicius, G. Janusas, V. Ostasevicius, A. Palevicius

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 65183Q (2007) https://doi.org/10.1117/12.714245
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

In the present research we have fabricated and investigated microfluidic device (system of periodic groves - diffraction grating) employing contact photolithography combined with the reactive ion etching (RIE). Relative diffraction efficiency of diffraction gratings (originally produced in silicon substrates) was measured experimentally and simulated using linear dimensions of gratings defined by scanning electron microscopy (SEM). The main experimental results were compared with the computer simulations where the standard software ("PCGrate-S 6.1") was employed to calculate relative diffraction efficiency of diffraction gratings for the different wavelengths of visible light. Comparing two evaluation methods: direct (electron microscopy) and indirect (relative diffraction efficiency measured at different angles of incidence for the three wavelengths of light) we have demonstrated feasibility of optical methods in control of geometrical dimensions of periodic structures at the microscopic range.

Citation Download Citation

T. Tamulevicius, S. Tamulevicius, M. Andrulevicius, G. Janusas, V. Ostasevicius, and A. Palevicius "Optical characterization of microstructures of high aspect ratio", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183Q (5 April 2007); https://doi.org/10.1117/12.714245

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