Realization of SOI submicrometer optical waveguide components

Xuejun Xu; Shaowu Chen; Jinzhong Yu; Xiaoguang Tu

doi:10.1117/12.760224

8 January 2008 Realization of SOI submicrometer optical waveguide components

Xuejun Xu, Shaowu Chen, Jinzhong Yu, Xiaoguang Tu

Proceedings Volume 6838, Optoelectronic Devices and Integration II; 68380L (2008) https://doi.org/10.1117/12.760224
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

Submicrometer channel and rib waveguides based on SOI (Silicon-On-Insulator) have been designed and fabricated with electron-beam lithography and inductively coupled plasma dry etching. Propagation loss of 8.39dB/mm was measured using the cut-back method. Based on these so-called nanowire waveguides, we have also demonstrated some functional components with small dimensions, including sharp 90° bends with radius of a few micrometers, T-branches, directional couplers and multimode interferometer couplers.

Citation Download Citation

Xuejun Xu, Shaowu Chen, Jinzhong Yu, and Xiaoguang Tu "Realization of SOI submicrometer optical waveguide components", Proc. SPIE 6838, Optoelectronic Devices and Integration II, 68380L (8 January 2008); https://doi.org/10.1117/12.760224

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