Continuing 193nm optical lithography for 32nm imaging and beyond

Emil C. Piscani; Dominic Ashworth; Jeff Byers; Chris Van Peski; Paul Zimmerman; Bryan J. Rice

doi:10.1117/12.775474

1 April 2008 Continuing 193nm optical lithography for 32nm imaging and beyond

Emil C. Piscani, Dominic Ashworth, Jeff Byers, Chris Van Peski, Paul Zimmerman, Bryan J. Rice

Proceedings Volume 6924, Optical Microlithography XXI; 69242I (2008) https://doi.org/10.1117/12.775474
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

The practical extendibility of immersion lithography to the 32nm and 22nm nodes is being supported on immersion microsteppers installed at SEMATECH in Albany, New York. As the industry pushes the limits of water-based immersion technologies, research has continued into developing alternative materials to extend optical lithography for upcoming device generations. High index materials have been the primary focus of investigation, including optical lens materials such as lutetium aluminum garnet (LuAG with n=2.14) and barium lithium fluoride (BaLiF3 with n=1.64), high index fluids (Gen 2 and Gen 3 with n>=1.64), and resists. On a parallel and potentially complementary path, double patterning and double exposure technologies have been proposed. For high index materials research, the Amphibian XIS has demonstrated imaging at 1.50NA (32nm half-pitch) with high index fluids. A prism module is also available to enable imaging with potential BaLiF₃ and LuAG prisms. The Exitech MS193i has demonstrated performance and imaging capability at 38nm hp with k₁=0.256 at 1.30NA. Modifications at the mask plane now provide a double exposure capability, offering an imaging platform to investigate experimental classes of nonlinear materials and enabling double exposure imaging below k_1eff=0.25. In this paper, we will discuss recent developments in these research areas supported by the toolset at SEMATECH.

Citation Download Citation

Emil C. Piscani, Dominic Ashworth, Jeff Byers, Chris Van Peski, Paul Zimmerman, and Bryan J. Rice "Continuing 193nm optical lithography for 32nm imaging and beyond", Proc. SPIE 6924, Optical Microlithography XXI, 69242I (1 April 2008); https://doi.org/10.1117/12.775474

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