An improved process for manufacturing diffractive optical elements (DOEs) for off-axis illumination systems

Jerry Leonard; James Carriere; Jared Stack; Rich Jones; Marc Himel; John Childers; Kevin Welch

doi:10.1117/12.774666

7 March 2008 An improved process for manufacturing diffractive optical elements (DOEs) for off-axis illumination systems

Jerry Leonard, James Carriere, Jared Stack, Rich Jones, Marc Himel, John Childers, Kevin Welch

Author Affiliations +

Proceedings Volume 6924, Optical Microlithography XXI; 69242O (2008) https://doi.org/10.1117/12.774666
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

We present advancements in the manufacture of high-performance diffractive optical elements (DOEs) used in stepper/scanner off-axis illumination systems. These advancements have been made by employing high resolution lithographic techniques, in combination with precision glass-etching capabilities. Enhanced performance of DOE designs is demonstrated, including higher efficiency with improved uniformity for multi-pole illumination at the pupil plane, while maintaining low on-axis intensity. Theoretical predictions of the performance for several classes of DOE designs will be presented and compared with experimental results. This new process capability results in improved performance of current DOE designs, and enables greater customization including control of the output spatial intensity distribution for future designs. These advancements will facilitate continuous improvements in off-axis illumination optimization required by the end user to obtain larger effective lithographic process windows.

Citation Download Citation

Jerry Leonard, James Carriere, Jared Stack, Rich Jones, Marc Himel, John Childers, and Kevin Welch "An improved process for manufacturing diffractive optical elements (DOEs) for off-axis illumination systems", Proc. SPIE 6924, Optical Microlithography XXI, 69242O (7 March 2008); https://doi.org/10.1117/12.774666

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