Tunable droplet momentum and cavitation process for damage-free cleaning of challenging particles

Roman Gouk; James Papanu; Fred Li; Jason Jeon; Tong Liu; Rao Yalamanchili

doi:10.1117/12.801549

17 October 2008 Tunable droplet momentum and cavitation process for damage-free cleaning of challenging particles

Roman Gouk, James Papanu, Fred Li, Jason Jeon, Tong Liu, Rao Yalamanchili

Proceedings Volume 7122, Photomask Technology 2008; 712211 (2008) https://doi.org/10.1117/12.801549
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

Particle removal without damage has been demonstrated for <60nm photomask sub-resolution assist features with droplet momentum cleaning technology that employs NanoDroplet^TM mixed-fluid jet nozzle. Although 99%+ particle removal efficiency can be achieved for standard Si₃N₄ particles with broad size distribution, there are some cleaning challenges with small (<100nm) and large contact area (>500nm) particles. It was found that tunable uniform cavitation can provide the additional physical assist force needed to improve cleaning efficiency of these challenging particles while meeting the damage-fee cleaning requirement. An integrated cleaning process was developed that combines both droplet momentum and damage-free cavitation technology. Cleaning tests were performed with different types of challenging particles. The results showed 5-8% particle removal efficiency improvement as compared to momentum based only cleaning. All masks were processed using the Tetra^TM mask cleaning tool configured with NanoDroplet^TM mixed fluid jet technology and full face megasonics.

Citation Download Citation

Roman Gouk, James Papanu, Fred Li, Jason Jeon, Tong Liu, and Rao Yalamanchili "Tunable droplet momentum and cavitation process for damage-free cleaning of challenging particles", Proc. SPIE 7122, Photomask Technology 2008, 712211 (17 October 2008); https://doi.org/10.1117/12.801549

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