A method for deposition of tungsten trioxide (WO[sub]3[/sub])

J. Martinez-Juárez; J. Díaz-Reyes

doi:10.1117/12.815958

2 December 2008 A method for deposition of tungsten trioxide (WO₃)

J. Martinez-Juárez, J. Díaz-Reyes

Proceedings Volume 7142, Sixth International Conference on Advanced Optical Materials and Devices (AOMD-6); 71420Q (2008) https://doi.org/10.1117/12.815958
Event: Sixth International Conference on Advanced Optical Materials and Devices, 2008, Riga, Latvia

Abstract

Thin films of tungsten oxide (WO₃) have been grown by hot-filament metal oxide deposition (HFMOD) technique under atmospheric pressure and an oxygen atmosphere on glass substrates. The thin film of WO₃ has been extensively studied as an electrochromic material and has numerous applications in electrochromic devices. In order to explore the possibility of using WO₃ in electrochromic devices, a preliminary and thorough study of the structural and optical properties of the host material is an important step. By the X-ray diffraction analysis the single phase natures, monoclinic and orthorhombic structure of the films have been confirmed. The IR spectra were constituted of many broad peaks in the 1400-3500 cm^-1 region That are assigned to ν(OH) and δ(OH) modes of adsorbed water. The corresponding WO₃ vibrations are in infrared regions of 1453-400 cm^-1 and 3454 cm^-1, which correspond to W-O stretching, bending and lattice modes. By Transmittance measures determines that the optical bandgap is around 2.92 eV. We have observed that the good quality WO³ thin films can be satisfactorily grown by this technique.

Citation Download Citation

J. Martinez-Juárez and J. Díaz-Reyes "A method for deposition of tungsten trioxide (WO₃)", Proc. SPIE 7142, Sixth International Conference on Advanced Optical Materials and Devices (AOMD-6), 71420Q (2 December 2008); https://doi.org/10.1117/12.815958

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