Paper
24 February 2009 High-speed roll-to-roll nanoimprint lithography on flexible substrate and mold-separation analysis
Se Hyun Ahn, L. Jay Guo
Author Affiliations +
Abstract
Continuous Roll-to-Roll NanoImprint Lithography (R2RNIL) provides greatly improved throughput by overcoming the challenges faced by conventional NIL in maintaining pressure uniformity and successful large-area imprinting and demolding. We present continuous imprinting of nanoscale structures with linewidth down to 70nm on a flexible plastic substrate. Our new process used a flexible and non-sticking fluoropolymer mold, and fast thermal and UV curable liquid resist materials. In addition, pattern quality in continuous R2RNIL process according to two different mold-separation directions has been analytically investigated.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Se Hyun Ahn and L. Jay Guo "High-speed roll-to-roll nanoimprint lithography on flexible substrate and mold-separation analysis", Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050U (24 February 2009); https://doi.org/10.1117/12.809821
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CITATIONS
Cited by 14 scholarly publications.
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KEYWORDS
Nanoimprint lithography

Ultraviolet radiation

Positron emission tomography

Coating

Liquids

Nanostructures

Nanolithography

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